• All sections
• G - Physics
• G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
• G03F 1/90 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Patent holdings for IPC class G03F 1/90

Total number of patents in this class: 4

10-year publication summary

Principal owners for this class